| Abstract |
| As the operation time of membrane filtration increases, more pollutants accumulate resulting in membrane fouling. The control of membrane fouling at proper time is directly related to operational and maintenance costs. It is very important to maintain the quality of the treated water while also extending the lifetime of the membrane. The purpose of this study was to evaluate the effects of introducing chlorine dioxide and flushing on nanofiltration (NF) processes at small water-purification facilities. In this study, the fouling control enabled by two series of NF pilot systems were compared by analyzing the increment rate of transmembrane pressure (TMP) measurements. For chlorine dioxide injection, the TMP increased in the initial stages of operation for both NF processes to a similar extent. However, a difference in TMP of 0.7 kgf/㎠ was observed between the two NF processes by the end of the experiment. In terms of flushing, the increase in differential pressure was 86% for the NF process with no flushing (process No. 1) and 200% for NF process with flushing (process No. 2), demonstrating a clear difference between the two NF processes. Therefore, the present results suggest that the addition of a flushing method during the stop time and the continuous input of chlorine dioxide can reduce membrane fouling caused by organic and inorganic materials. The findings have implications for the long-term operation of NF processes, allowing for not only reduced stable operation but also greater stability in water quality. |
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| Key Words |
| Nanofiltration, NF, Chlorine Dioxide, Flushing, TMP, 나노여과, 이산화염소, 물리적 세정, 막간차압 |
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