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DOI : 10.17640/KSWST.2019.27.3.3 , Vol.27, No.3, 3 ~ 13, 2019
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| Title |
| A Comparison of Phenol Treatment by pH and Additional Materials in Plasma Oxidation |
| 최승규 Seung-kyu Choi , 신관우 Gwan-woo Shin , 주천 Zhu-qian , 김진수 Jin-su Kim , 이상일 Sang-ill Lee |
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| Abstract |
| In this study, the treatment rate of phenol was compared by initial pH, magnesium source and activated carbon using underwater plasma process. When the initial pH were 4, 7, 10 and 12.5, phenol removal efficiency was the highest at pH 12.5. The larger amount of OH- used in the reaction, the formation of OH radical is better. Therefore, the phenol removal rate would have increased at high pH. MgO, MgSO4, Mg(OH)2 were used as a magnesium sources and initial pH was 10. The removal efficiency of MgO and Mg(OH)2 was higher than that of MgSO4 and control. The magnesium ion itself has no effect on removal efficiency. It is considered that oxygen and OHattached to MgO and Mg(OH)2 contributed to the increase of removal efficiency. The removal efficiency increased with the addition of GAC to the plasma process. Unlike the magnesium injecting, COD removal efficiency rate increased. It is considered that the activated carbon adsorbs phenol itself without decomposition into intermediates. injection of the additional materials to the plasma oxidation can increase the efficiency and overcome the limitations of the operating conditions. |
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| Key Words |
| Additive, AOPs, Phenol, Plasma, Radical |
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