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DOI : ,    Vol.20, No.5, 43 ~ 50, 2012
Title
Removal of Silica in Semiconductor Wastewater using Magnetite
강한솔 Han Sol Kang , 강정규 Jung Kyu Kang , 강민구 Min Koo Kang , 류홍덕 Hoo Duck Ryu , 이상일 Sang Ill Lee
Abstract
This study was aimed to evaluate magnetite`s ability in treating silicate of back grinding wastewater which is generally produced from semiconductor industry, The back grinding wastewater is the super pure water as the water come out of the semiconductor process and includes the partial silicon powder, By using the magnetite, that is the nano particle implying the magnetism in this wastewater, the silicon grain was absorbed and it removed. The optimum dosage of magnetite, pH, mixing intensity and duration time were investigated and the best silicate removal was 97 % at the magnetite dosage of 0.0 16mg/mL the pH range of 2 to 8 respectively. The magnetic force was also important parameter on the silicate removal. The silicate removal was not affected with magnetic force in the sedimentation time of over 10 mm, whereas, the silicate removal increased as magnetic force increased when the sedimentation time was below 10 mm.
Key Words
Magnetite, Silicate, Back grinding wastewater, Magnetic force
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